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News and Announcements
CVD System
CVD System

 

It is a powerful technique used for the fabrication of variety of thin films, CNT’S and graphene on different type of substrates.

Specifications:

Precursor gas: acetylene, ammonia

Carrier gas: Argon

Working pressure: atmospheric pressure – 10-3torr

Temperature: 25oC to 1350oC

Gas flow controller: yes